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JB/T 8554-1997 Scratch test method for adhesion of vapor deposited films to substrates

Basic Information

Standard ID: JB/T 8554-1997

Standard Name: Scratch test method for adhesion of vapor deposited films to substrates

Chinese Name: 气相沉积薄膜与基体附着力的划痕试验方法

Standard category:Machinery Industry Standard (JB)

state:in force

Date of Release1997-04-15

Date of Implementation:1998-01-01

standard classification number

Standard Classification Number:Comprehensive>>Basic Standards>>A29 Material Protection

associated standards

Publication information

other information

Focal point unit:National Technical Committee for Standardization of Metallic and Non-metallic Coverings

Publishing department:National Technical Committee for Standardization of Metallic and Non-metallic Coverings

Introduction to standards:

JB/T 8554-1997 This standard specifies the test method for determining the diamond indenter scratch resistance of the interface between vapor-deposited TiNx and other hard films and substrates. This standard applies to vapor-deposited hard films and vapor-deposited injection films. For any specific application, the specified test method can be improved by supplementary information. These information should come from the corresponding international standards, advanced industrial country standards or national standards, industry standards and other relevant documents. If necessary, the test and sample submission parties can also negotiate and propose relevant documents. JB/T 8554-1997 Scratch test method for adhesion between vapor-deposited films and substrates JB/T8554-1997 Standard download decompression password: www.bzxz.net
JB/T 8554-1997 This standard specifies the test method for determining the diamond indenter scratch resistance of the interface between vapor-deposited TiNx and other hard films and substrates. This standard applies to vapor-deposited hard films and vapor-deposited injection films. For any specific application, the specified test method can be supplemented by supplementary information. Such information should come from the corresponding international standards, advanced industrial country standards or national standards, industry standards and other relevant documents. If necessary, the test and sample submission parties can also negotiate and propose relevant documents.


Some standard content:

Mechanical Industry Standard of the People's Republic of China
JB/T8554—1997
. Scratch Test Method for Adhesion of Vapor Deposited Film to Substrate
Published on April 15, 1997
Ministry of Machinery Industry of the People's Republic of China
Implementation on January 1, 1998
JB/T8554-1997
This standard is one of the series of standards on sampling and testing of vapor deposited TiN and other hard films. This standard is formulated for the first time.
This standard is proposed by the National Technical Committee for Standardization of Metallic and Non-metallic Coatings and is under the jurisdiction of the responsible drafting units of this standard: Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Dalian University of Technology. The main drafters of this standard are: Yu Deyang, Weng Lijun, Wang Ru, Wang Xiaoping, Hua Minqi. This standard was first issued on April 15, 1997. 1 Scope
Standard of the Machinery Industry of the People's Republic of China
Scratch Test Method for Adhesion of Vapor Deposited Film to Substrate
JB/T85541997
This standard specifies the test method for determining the diamond indenter scratch resistance of vapor deposited TiN and other hard films-substrate interfaces. This standard is applicable to vapor deposited hard films and vapor deposited lubricating films. For any specific application, the specified test method can be improved by supplementary information. These information should come from the corresponding international standards, advanced industrial country standards or national standards, industry standards and other corresponding documents. If necessary, the corresponding documents can also be proposed by negotiation between the test and sample submission parties.
2 Referenced Standards
The provisions contained in the following standards constitute the provisions of this standard by reference in this standard. The versions shown are valid at the time of publication of this standard. All standards will be revised, and the parties using this standard should explore the possibility of using the latest versions of the following standards. GB 6463-86
GB/T2848-92
GB/T4342-92
JB/T 7505--94bzxZ.net
JB/T7707~95
3 Method Overview
Review of Thickness Measurement Methods of Metals and Other Coverings Technical Requirements of Rockwell Hardness Tester
Metal Micro-Vickers Hardness Test Method
Technical Terminology of Ion Plating
Test Method of Thickness of Ion Plating Hard Film Ball Milling Method According to the vertical load that increases automatically and continuously on the indenter, the minimum load required to completely scratch the film and continuously peel it off from its substrate is measured. That is, the critical load Lc of film-substrate interface adhesion failure. 4 Instrument
The structural principle of the automatic scratch tester for measuring L· is shown in Figure 1. The instrument consists of the following main components: A-indenter continuous loading motor: B-acoustic emission probe, which detects the acoustic emission intensity generated by scratches and inputs it into the microcomputer; C-Rockwell hardness tester standard indenter; D-sample table; E-displacement motor, which is used to drag the sample table in the horizontal direction at a uniform speed; F-tangential friction sensor, which continuously detects the friction between the indenter and the film and inputs it into the microcomputer; G-~sample table height lifting screw; H-loading pressure sensor; I-optical microscope (≥40×); J-signal amplifier; K-conversion controller; L-microcomputer, which is used to implement test self-control and automatic data processing, and dynamically display and store data and graphics; M-sample; N-CRT display: O-plotter, which outputs test results; P-indenter loading mechanism: Q-main bracket. Approved by the Ministry of Machinery Industry on April 15, 1997
Implemented on January 1, 1998
5 Test specimen
5.1 Substrate
a) Shape and size
JB/T 8554-1997
Figure 1 Schematic diagram of the structure of the automatic scratch tester
Cuboid: length 40~50mm. width 30~45mm height 6~20mm; or cylinder s (40~45) mm×(6~20) mmb) Hardness
Measure the Rockwell hardness (HRC) of the substrate according to the method and technical conditions specified in GB/T2848. c) Average roughness R of the working surface, ≤0.32μm. d) The material and its status shall be clearly filled in by the party sending the sample. 5.2 Film
a) Thickness
The thickness of the film shall be measured by one of the methods specified in JB/T7707 or GB6463, and shall be ≥0.1μm. b) Microhardness (HV)
The microhardness of the film shall be measured by the method specified in GB/T4342. c) Average surface roughness of the film R≤0.32umd) The film deposition method shall be filled in by the party sending the sample. 6 Test Procedure
6.1 General
6.1.1 Environmental Conditions
The sample shall be placed at a temperature of (20±5)°C and a relative humidity of (50±10)%RH for at least 8h. Then the test shall be conducted according to the specified steps. The test machine and microcomputer system shall not be subjected to vibration and impact during the test. 6.1.2 Diamond indenter
Select a diamond indenter (apex angle 120°, top radius R within 200um±5m) according to the conditions specified in GB/T2848. Check the indenter under a microscope with a magnification of not less than 40 times to confirm that its top is a smooth and clean spherical surface before use. 6.1.3 Fix the diamond indenter in the chuck so that its axis is perpendicular to the film surface. 6.1.4 Test conditions
a) Scratch speed: (10±1) mm/min; JB/T8554-1997
b) Loading rate: (20~40) N/min for hard films; (5~10) N/min for non-hard films; c) Loading accuracy: 0.03N.
6.2 Mechanized instrument test steps
Perform at least five repeated tests on three parallel samples according to the following operating steps. 6.2.1 Fix the sample on the sample table, with the film facing upward and its long side parallel to the scratch direction. 6.2.2 Use acetone cotton balls to clean the film and the surface of the pressure head respectively, and dry them. 6.2.3 Select the "automatic test" mode from the main menu of the microcomputer, that is, select the mode that can simultaneously measure the acoustic emission intensity and friction force of the scratch; select the input loading rate and scratch speed and other test conditions, and stand by for the scratch test. Adjust the horizontal position of the microcomputer to put the tangential pressure sensor in place (i.e. calibrate to "0"); adjust the height of the sample table to make the surface of the sample touch the pressure sensor. 6.2.4
Adjust the position of the loading screw to make the front end of the crossbeam touch the fulcrum of the loading pressure sensor and the load display is 0. The constant speed motors for loading and displacement are both in standby state.
6.2.6 Press the Enter key. The host starts the automatic test: the displacement motor drags the sample, and the pressure head automatically and continuously loads. It is tested by the loading pressure sensor, and the friction force is tested by the tangential friction pressure sensor, and input into the microcomputer; so that each scratch can be displayed on the microcomputer screen. The KL curve of the acoustic emission signal intensity K changing with the vertical load L and the FL curve of the friction force F changing with L, as shown in Figure 2. When the signal is weak, the keyboard can be used to select appropriate gains for the two signals to display their details: the critical loads LeF, Lck\ of film cohesive failure and the critical loads LK, Ler· of interface failure are found by the automatic search subroutine, and the test results and graphics are stored as files for computer display and print output.
(a) KL curve
Figure 2 Schematic diagram of scratch test results
6.2.7 Determine the scratch width d. Give the value dc when d suddenly increases; LeF
(b) FL curve
6.2.8 Observe each scratch under a microscope, especially the morphology at the inflection points B and D. Take typical morphology photos for reference when comprehensively analyzing and determining the Lc test results.
7 Test data processing
According to 6.2., for each scratch of the three parallel samples of each batch of products, the KL curve, FL curve, dc and typical scratch morphology photos are analyzed comprehensively to determine the Lck; and LcF; values ​​of a single scratch test; the arithmetic mean value of Lck and LcF (as shown in Figure 2) and their standard deviation S are given by all Lc:
Where: n---the number of independent single measurements, n≥15Test report content
a) Indicate this standard and other relevant documents: JB/T 8554-1997
C(Lc:-- Le) /(n -- 1)
b) the model of the test equipment and the level of metrological certification; c) give the final result and its standard deviation.
Mechanical Industry Standard of the People's Republic of China
Scratch Test Method for Adhesion of Vapor Deposited Film to Substrate
JB/T 8554-1997
Published and distributed by the Mechanical Standardization Research Institute of the Ministry of Machinery Industry Printed by the Mechanical Standardization Research Institute of the Ministry of Machinery Industry (No. 2 Shouti South Road, Beijing, Postal Code 100044)*
Format 880×12301/16 Printing Sheet 1/2 Number of Words 10.000 First Edition in July 1997
First Printing in July 1997
Number of Prints 00.001-500 Cost 5.00 Yuan
No. 97-137
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