JB/T 8946-1999 This standard specifies the technical requirements, test methods, inspection rules, marking, packaging, transportation and storage of vacuum ion plating equipment. JB/T 8946-1999 Vacuum ion plating equipment JB/T8946-1999 Standard download decompression password: www.bzxz.net

ICs 23. 160
Machinery Industry Standard of the People's Republic of China
JBT8946-1999
Vacuum ion coating plant
Issued on July 12, 1999
National Machinery Industry Standard
2000-01-01 Implementation
JB/TB9461999
This standard is proposed and approved by the National Vacuum Technology Standardization Committee. The drafting unit of this standard is Shenyang Vacuum Technology Research Institute. The main drafters of this standard are Jin Shi, Xue Chunying and Li Yuying. 1 Standard
Machinery Industry Standard of the People's Republic of China
Vacuum ion coating plant
JB/T 8946—[999
This standard specifies the technical requirements, test methods, inspection rules, marking, packaging, transportation and storage of vacuum ion plating equipment. This standard is applicable to vacuum ion plating equipment (hereinafter referred to as equipment) with a pressure range of 10+-10-Ta, including the following types: multi-arc ion, arc discharge type, hollow cathode ion (CD), frequency ion chain (RFIP), direct discharge type (DCIP), cathode type, active reaction evaporation mirror (ARE), enhanced ARE, low pressure plasma ion plating (LFPD), electric field evaporation, brain bottom heating, beryllium, group ion beam, etc. Note: Ion plating is carried out under vacuum or conditions, using gas discharge to transform the gas sample or the evaporated material into part, and while the gas ion supports the evaporation material and then acts on the substrate, the evaporation material or its reaction is deposited on the substrate. 2 Referenced standards
The clauses contained in the following standards constitute the text of this standard by reference in this standard. When this standard is published, the versions shown are valid. All standards will be revised. Each party using this standard should discuss the possibility of using the latest version of the following standards. GB/T60701995 Vacuum flange
GB:T11164—1999 General technical conditions for vacuum coating equipment 3 Technical requirements
3.1 Normal working conditions of equipment
3.1.1 Ambient temperature: 10℃-30℃
3.1.2 Relative humidity: not more than 75%.
3.1.3 Cooling water inlet temperature: not more than 25℃. 3.1.4 Cooling water quality: city tap water or water of equivalent quality. 3.1.5 Power supply: 38GV = 50Hz or 220V single phase 50Hz (depending on the electrical appliances used): voltage fluctuation range: 342~399V or 198-211V; frequency fluctuation range: 49~51Iz.
3.1.. The pressure, temperature, consumption, etc. of the compressed air, concentrated air, cold water, boiled water, etc. carried by the equipment shall be clearly stated in the product manual.
3.1.7 The surrounding environment of the equipment shall be clean and the air shall be sterile. There shall be no small amount of dust or gas that may cause corrosion to electrical appliances and other metal parts and cause conduction between metals.
3.1 Technical parameters of equipment
3.7.1 The main technical parameters of the equipment shall comply with the provisions of Table 1. Approved by the Ministry of Industry and Information Technology on July 12, 1999, and implemented on January 1, 2000
Ultimate pressure
Gasping time
JB/T89461999
55×10-
[10*-7 × 10: Pa]
32.1 The working condition of the deposition source of the equipment should be stable, reliable, safe: and easy to adjust and control. 3.2.3 When the equipment is in the process of forging a film, the workpiece is generally at a negative potential relative to the vacuum chamber body, and the vacuum chamber is grounded: B
(10-7 × 10'Pa)
3.2.4 The deposition source, workpiece, and vacuum chamber body are all connected to different potentials. The minimum and maximum potentials are determined by the different types and different functional requirements of the double-film equipment.
3.3Conclusion
3.3 The structural type of high-tech pipelines and static sealing parts (flanges, sealing parts, etc.) in the equipment shall comply with the provisions of G8T6970.
3.3.2 Vacuum measuring tubes should be installed on the low vacuum and high vacuum channels and on the vacuum film chamber to measure the vacuum of each part respectively. When the generator causes interference to the measurement, an electric field shielding device should be installed at the measuring port. 3.3,3 If the main pump used in the equipment is a diffusion pump, a pool steam trap should be installed on the air inlet side of the ticket. 3,3.4 The film chain of the equipment is equipped with an observation window. The observation window is equipped with a blocking device. The observation window can observe the operation of the deposition source and other related parts.
3.3.5 The design of the ion chain deposition source should maximize the high-temperature deposition rate in the film process, improve the utilization rate of the membrane material, reasonably match the deposition rate of the source, and reasonably arrange the position of the deposition source in the vacuum chamber. 3.3. (Reasonably arrange the heating device. The structure of the heater should make the workpiece uniform. 3.3. The workpiece rack should be insulated from the vacuum chamber. The design of the workpiece rack should make the film layer of the workpiece uniform. 3.3.8 The ion plating equipment should generally have a negative bias and an ion attenuation power supply. The ion attenuation power supply should have a device to suppress abnormal changes and maintain stable operation:
3.3.9 The insulation value between the parts of the vacuum chamber with different potentials shall be in accordance with GB/T1 4.4.6.3.4 Countermeasures for quality control in B1164-1999 shall be in accordance with 4.4 in B11164-1999.
3.5 Safety protection shall be in accordance with 4.5 in QBT1164-1999.
4 Test method
4.1 Determination of ultimate pressure
4.1. Test method
5.1 in B1164-1999,
4. 1.1 Test method
According to 5.1.2 of GRT 11164-1999. 4.2 Determination of pumping time
According to 5.2 of R/T11164--1999
4.3 Determination of pressure rise rate
According to 5.1 of GB/1116A-1999 www.bzxz.net
Control and license planning
According to Chapter 6, 6 Marking, packaging, transportation and storage of GB/11164--1999
According to Article 7 of GBT[1164--1999.
JBT$946-1999
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